Grafting of metallacarboranes onto self assembled monolayers

Grafting of Metallacarboranes onto Self-Assembled Monolayers Deposited on Silicon Wafers

Amine-, oxyamine-, and isocyanate-terminated self-assembled monolayers were deposited on silicon wafers for reaction with cobaltabisdicarbollide derivatives. The reaction of the isocyanate group with [NMe₄][8-NH₂-C₄H₈O₂-3,3-Co(1,2-C₂B₉H₁₀)(1,2-C₂B₉H₁₁)] gave homogeneous monolayers of cobaltabisdicarbollide moieties covalently linked to the surface.

Grafting of metallacarboranes onto self assembled monolayers